Chair, Seong Bong Kim (Nat’l Fusion Research Inst., Korea)
Co-Chair, Wonho Choe (KAIST, Korea) Lists of Invited Speakers in this Sub-Session

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Plasma Farming

Requirements and considerations for atmospheric pressure plasma sources for plasma farming	Won Ho Choe	KAIST, Korea
Scaling plasma systems for the Agri-Food sector	P. J. Cullen	University of Nottingham, UK
Plasma in Hydroponics and in Produce Washing	Gregory Fridman	Drexel University, USA
Activity promotion of microorganisms and enzyme degradation of biomass using radical irradiations	Masafumi Ito	Meijo University, Japn
MicroRNA-7450 and microRNA-100 regulates non-thermal DBD plasma-induced chicken Sertoli cell proliferation	Dong Kee Jeong	Jeju National University, Korea
Innovative processed meat manufacturing using cold plasma technology	Cheorun Jo	Seoul National University, Korea
Effects of plasma on cellular differentiation and metabolic activity in beneficial fungi	Gyungsoon Park	Kwangwoon University, Korea
Plasma-functionalized solution and its applications for Plasma Farming	Sanghoo Park	KAIST, Korea
Agricultural Productivity Enhancement Using Low Temperature Plasmas	Masaharu Shiratani	Kyushu University, Japan
Biological Applications Using Pulsed Power Technology	Douyan Wang	Kumamoto University, Japan

• [Plasma Cultivation] Plasma Sources and Applications in Plant or Animal Cultivation
• [Plasma Post-harvest] Plasma Sources and Applications in Fresh Produce Storage
• [Plasma Food Safety] Plasma Sources and Applications in Food Process and Safety
• [Plasma Farming Platform] Diagnostics, Simulation and Mechanism Study for Plasma Farming
• Etc.

Chair, Eun Ha Choi (Kwangwoon Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Plasma Bioscience & Medicine

KEYNOTE Chemical and Biological Mechanisms of Plasma Interaction with Biosystems	Alexander Fridman	Drexel University, USA
KEYNOTE Novel cancer treatments based on syntheticapproaches of plasma-activated liquids	Masaru Hori	Nagoya University, Japan
KEYNOTE From single plasma jets to large atmospheric plasma sources for biological applications	Jean-Michel Pouvesle	GREMI, CNRS/University of Orleans, France
KEYNOTE Research and development of plasma sources for applications in life science.	Klaus Dieter Weltmann	INP Greifswald, Germany
Combined effect of cold plasma and nanoemulsion-based drug delivery system for targeting human melanoma	Manish Adhikari	PBRC, Korea
Role of protein folding in plasma medicine	Pankaj Attri	University of Antwerp, Belgium
Development and application of skin equivalents forthe investigation of atmospheric pressure plasma	Ku Youn Baik	Kwangwoon University, Korea
Cold Atmospheric Pressure Plasma Treatment to Assist Bacterial Inactivation and Tooth Restoration in Endodontic Procedures	Vittorio Colombo	University of Bologna, Italy
Cold plasma assisted wound healing: from bactericidal effects to tissue regeneration	Svetlana Ermolaeva	Gamaleya Research Center of Epidemiology and Microbiology, Russia
Mechanisms and Control of Plasma Biomedical Processes	David Graves	University of California, USA
Cold atmospheric plasma for the treatment of intraoral (precancerous) lesions - in vitro and in vivo investigations	Sybille Hasse	INP Greifswald, Germany
Current Status and Future Challenges in Modeling and Numerical Simulation for Plasma Medicine	Satoshi Hamaguchi	Osaka University, Japan
The effect of melanogenic differentiation by non-thermal atmospheric biocompatible plasma	Ihn Han	Kwangwoon University, Korea
Comparison of ROS Diagnostic Methods for Atmospheric-pressure Plasmas at Gas-Liquid Environment	Seiji Kanazawa	Oita University, Japan
Plasma induced immuno-modulations for medical applications	Nagendra Kaushik	Kwangwoon University, Korea
Application of cold atmospheric plasma to overcome drug-resistance in cancer cells	Sun Jung Kim	Dongguk University, Korea
Plasma Bioscience in Dentistry	Jae Sung Kwon	Yonsei University, Korea
Plasma and ROS Effects on G-Protein Coupled Receptor Signaling	Weontae Lee	Yonsei University, Korea
Influence of reactive oxygen and nitrogen species on the plasmid DNA and transformation of Escherichia coli with plasmid	Geon Joon Lee	Kwangwoon University, Korea
The transdermal and wound healing effect of plasma activated medium	Dawei Liu	Huazhong University of Science and Technology, China
The effect of tissue and medium on the penetration of RONS generated by plasma	XinPei Lu	HuaZhong University of Science and Technology, China
Cold Atmospheric Pressure Plasma Mediated Wound Healing	Kai Masur	INP Greifswald, Germany
Long term investigation of radical activated water	Jun-Seok Oh	Osaka City University, Japan
Novel surface assisted laser desorption / ionization mass spectrometry using carbon nanowalls for analyzing bio molecule	Takayuki Ohta	Meijo University, Japn
Propertiesof Dawoo Korea Plasma Sterilizer Using Nonthermal Atmospheric Pressure	Jang Sick Park	Korea Industrial Technology Association, Korea
Cold plasma promotes angiogenesis in acute rodent wounds	Anke Schmidt	INP Greifswald, Germany
The effect of cold atmospheric pressure plasma (CAP) on cell migratory behaviors and molecular markers of wound healing machinery	Debarati Shome	INP Greifswald, Germany
Nitrogen Monoxide Generation by Microwave Plasma Torch.	Hansup Uhm	Kwangwoon University, Korea
Plasma in cosmetic applications: possibilities and boundary conditions	Thomas von Woedtke	INP Greifswald, Germany
Insight into the Molecular Dynamic Simulation Studies of Reactive Oxygen Species in Native and Oxidized skin membrane	Dharmendra Kumar Yadav	Gachon University of Medicine and Science, Korea

• Plasma Biosciences
• Plasma Medicine
• Nonthermal Bioplasma Sources and Diagnostics
• Plasma Bio / Nano Materials, Films, and Scaffolds
• Nonthermal Atmospheric Pressure Plasma Sources and Their Characteristics for Biomedicines
• Plasma-Liquid Interaction for Biomedical Science
• Etc.

Chair, Han-Bo-Ram Lee (Incheon Nat’l Univ., Korea)
Co-Chair, Se Hun Kwon (Pusan Nat’l Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Plasma ALD / PECVD

Plasma-assisted atomic layer deposition of SiN.	Sumit Agarwal	Colorado School of Mines, USA
A toolbox for an all-ALD earth-abundant resonant tunneling junction solar cell	Sean Barry	Carleton University, Canada
BN Electron-Enhanced ALD at Room Temperature and Prospects for Area Selective Deposition	Steven George	US Boulder, USA
Remote Plasma ALD for Lowk dielectric	Hyeongtag Jeon	Hanyang University, Korea
Ion-surface interaction during plasma ALD and how it can be used to tailor film properties	Erwin Kessels	Eindhoven University, Netherlands
ALD-induced Blending of Polymers with Ceramics for novel Functional Hybrids	Mato Knez	CIC nanoGune, Spain
PEALD of protective metallic coatings for metallic bipolar plates of PEMFC	Se Hun Kwon	Pusan National University, Korea
Surface Energy Control for Hydrophobic Coating by Atomic Layer Deposition	Han-Bo-Ram Lee	Incheon National University, Korea
Research in Thermal Area Selective Atomic Layer Deposition and Atomic Layer Etching for Advanced Device Patterning	Gregory N. Parsons	NC State University, USA

• PEALD
• Next Generation PECVD
• Materials Processing by PECVD / PEALD
• Etc.

Chair, Junghoon Joo (Kunsan Nat’l Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Sputtering / Ion Beam Deposition

ECR Plasma Enhanced Sputtering and Applications	Seong Bong Kim	National Fusion Research Institute, Korea
PIC-MC simulation study of rotational magnetron sputtering	Andreas Pflug	Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany
Effect of Interface on the Structure and Ferro-electric Property of Y-doped HfO​2​ Thin Films Prepared by Reactive Magnetron Co-Sputtering	Jun Xu	Dalian University of Technology, China

• Sputter Deposition (Biasing, Pulsing, ICP-assisted, Reactive, etc)
• Ion Beam Deposition
• Properties of Materials Deposited by Sputtering
• Etc.

Chair, Goo-Hwan Jeong (Kangwon Nat’l Univ., Korea) Lists of Invited Speakers in this Sub-Session

• Plasma Process for Nanomaterial Synthesis
• Plasma Functionalization (Doping) on Nanomaterials
• Atmospheric Plasma Process for Nanomaterials
• Solution Plasma Process for Nanomaterials
• Etc.

Chair, Geun Young Yeom (Sungkyunkwan Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Next Generation Plasma Etching, Ashing, and Patterning

KEYNOTE Challenges to the next generation semiconductor equipment by using plasma	Kuntack Lee	Samsung, Korea
Hairpin probes absolute electron density measurements for spatio-temporal measurements: addressing the challenging requirements for industrially-relevant plasma applications	Bert Ellingboe	Dublin City University, Ireland
Methodsto Enable Plasma Etching of Transition Metals with Atomic Scale Precision	Eric A Joseph	IBM, USA
Plasma and Feature Scale Models for Etching of High Aspect Ratio Silicon Structures in Pulsed Inductively Coupled Plasmas.	Jason Kenney	Applied Materials, USA
Some Aspects of Process Development in Plasma Etching	Nam Hun Kim	APTC, Korea
Etching of Semiconductor Devices	Thorsten Lill	Lam Research Corporation, USA
Frontiers of industrial application of atomic layer etching	Alok Ranjan	Tokyo Electron Ltd. Technology Center America, USA
Isotropic Atomic Layer Etching of ZnO on 2D and 3D substratesusing acetylacetone and O2 plasma	Fred Roozeboom	Eindhoven University of Technology, Netherlands
Atomic Layer Defect-free Top-down Processes for Future Nano-devices	Seiji Samukawa	Tohoku University, Japan

• Plasma Etching Technologies for Next Generation Semiconductors
• Plasma Etching / Ashing
• Atomic Layer Etching / Atomic Layer Cleaning (invited only)
• Nanopatterning
• Etc.

Chair, Gon Ho Kim (Seoul Nat’l Univ., Korea) Lists of Invited Speakers in this Sub-Session

• Plasma Diagnostics and Processing Monitoring (Electrical, Optical, etc)
• Etc.

Chair, Taesung Kim (Sungkyunkwan Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Contamination Control in Semiconductor / Display Technologies

Challenges of Particle Control Technology in the Semiconductor and Display Process Equipments	Seungki Chae	Sungkyunkwan University, Korea
Towards Automation of Quantitative Analysis of Various Digital Images for Material and Process Characterization	Woo Sik Yoo	WaferMasters, Inc., USA

• Particle Measurement Techniques
• Plasma Process Monitoring
• Airborne Molecular Contamination Control
• Methods for Particle Related Issues
• Etc.

Chairs, Hong Young Chang (KAIST, Korea)
Ho-Jun Lee (Pusan Nat’l Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Plasma Sources and Technologies

KEYNOTE INCA: A new scalable large area plasma source at low pressures	Uwe Czarnetzki	Ruhr University of Bochum, Germany
Challenges for future rf driven plasma systems	Rod Boswell	Australian National University, Australia
The Triple DC Plasma Torch System for Nanoparticle Synthesis	Sooseok Choi	Jeju National University, Korea
The experimental and numerical investigations of electron characteristics in 2 MHz and 13.56 MHz inductively coupled hydrogen plasmas	Fei Gao	Dalian University of Technology, China
Microwave plasma sources based on microstrip line for material processing	Jaeho Kim	Advanced Industrial Science and Technology, Japan
Experimental and computational investigation on striations in electronegative capacitively couple rf discharges	Yong-Xin Liu	Dalian University of Technology, China
Investigation of Characteristics of Multiphase AC Arc by High-speed Visualization	Takafumi Okuma	Panasonic Corporation, Japan
Inductively-coupled plasma and laser-produced plasma source researches at GIST	Hyyong Suk	GIST, Korea
Generation of vibrationally excited nitrogen in a DC discharge sustained by repetitive nanosecond pulses	Keisuke Takashima	Tohoku University, Japan
Investigation of carbon dioxide decomposition in a micro-slit discharge at low pressures	Hai-Xing Wang	Beihang University, China
Performance and plasma characteristics of Low-Power Ammonia Arcjet Thruster	Xian Meng	Institute of Mechanics, Chinese Academy of Sciences, China
Numerical study on generation of large currents in atmospheric very high frequency discharges modulated by pulses	Yuantao Zhang	Shandong University, China

• Plasma Sources (RF Plasma, DC Plasma, Plasma Propulsion, Thermal Plasma, Laser Plasma, Magnetized Plasma, etc.)
• Etc.

Chair, Hae-June Lee (Pusan Nat’l Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Modeling and Simulation Techniques

Importance of Consideration of Thermal Diffusion Effects in a Non-isothermal Capacitively Coupled Plasma Reactor	Ho Jun Kim	Samsung Electronics, Korea
Realistic treatment of plasma-surface interactions in simulations of low temperature plasmas	Julian Schulze	Ruhr University of Bochum, Germany
Fluid and PIC simulations on electronegative SiH4 and O2 discharges in RF CCPs	Yuan-Hong Song	Dalian University of Technology, China
3D particle simulations and analysis of streamer discharge in atmospheric air	Anbang Sun	Xi’an Jiaotong University, China
Modeling of plasma-enhanced ALD for silicon oxide films as clarification of fundamental deposition mechanism	Kosuke Yamamoto	Tokyo Electron Technology, Japan

• Sheaths / Plasma Physics / Plasma Kinetics / Fundamental Plasma Physics
• Modeling / Numerical Analysis / Plasma Simulations
• Dusty Plasmas / Strongly Coupled Plasmas
• Etc.

Chair, Won Jong Yoo (Sungkyunkwan Univ., Korea) Lists of Invited Speakers in this Sub-Session

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Nano Devices Using 2D Materials

Energy dissipation and light emission in graphene	Myung-Ho Bae	KRISS, Korea
Electrolyte-Gated Flexible Graphene Schottky Barrier Transistors	Jeong Ho Cho	Sungkyunkwan University, Korea
Use of doped-graphene transparent condutive electrodes for optoeletronic device	Suk-Ho Choi	Kyung Hee University, Korea
Evaluation of layer number of graphene with AFM, reflectance, and Raman scattering	Mun Seok Jeong	Sungkyunkwan University, Korea
Electrically tunable 2D devices with exceptional functions	Gwan-Hyoung Lee	Yonsei University, Korea
Normalization of work function of a conducting tip for electrical scanning probe microscopy (ESPM)	Haeseong Lee	Jeonju University, Korea
Protocol for the Electrical Characterization of Powder-type Graphene Materials	Ha-jin Lee	Korea Basic Science Institute, Korea
Reconfigurable 2D Devices for Artificial Neural Network Applications	Ji-Ung Lee	CNSE, USA
Synthesis and Characterization of Atomic and Electronic Properties of Graphene-based Heterostructure	Young Jae Song	Sungkyunkwan University, Korea
Measurement of EMI shielding effectiveness with near field probe for CNT	Soon-Il Yeo	ETRI, Korea
2D materials based ISFETs for pH sensing applications	Chunxiang Zhu	National University of Singapore, Singapore

• Plasma Related Processing Issues of 2D Materials
• Interface Related Issues Involving Van Der Waals Surface of 2D Materials
• Electrical and Photonic Properties of 2D Materials
• Mechanical and Thermal Device Application of 2D Materials
• Electronic, Photonic, Energy, and Biomedical Applications of 2D Materials
• Processing Technology for Nanodevice Fabrication Using 2D Materials
• Characterization of 2D Materials and Devices
• Standardization for Graphene and Other 2D Materials
• Etc.

Chair, Nae-Eung Lee (Sungkyunkwan Univ., Korea)

• Biosensors for Point-of-care-testing
• Sensors for IOT
• Flexible / Stretchable Sensors for Wearable Electronics
• Etc.

Chair, Il Ki Han (KIST, Korea) Lists of Invited Speakers in this Sub-Session

• Solar Cells / Fuel Cells
• Etc.

Chair, Munpyo Hong (Korea Univ., Korea)

• Flexible / Stretchable Display Devices
• Processing Technologies for Flexible / Stretchable Displays
• Etc.