ICMAP 2018

Program at a Glance
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as of July 20, 2018

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July 24 (Tue.)
Time/Place		Room A (#104~106)	Room B (#113)	Room C (#114)	Room D (#115)	Room E (#107~108)	Room F (#117~118)	Lobby
09:00-13:00	240'							Registration
13:00-18:00	300'		Tutorial Session 1 [Bioplasma]	Tutorial Session 2 [Process Plasma : Deposition Processes]
18:00-18:15	15'

July 25 (Wed.)
Time/Place		Room A (#104~106)	Room B (#113)	Room C (#114)	Room D (#115)	Room E (#107~108)	Room F (#117~118)	Lobby
09:00-10:00	60'	WA1 Contamination Control in Semiconductor / Display Technologies	ISPB 2018WB1 Plasma Medicine for Skin Applications Ⅰ	WC1 Plasma and Liquid Ⅰ	WD1 Modeling and Simulation of Plasma-Surface Interaction	WE1 Nano Devices Using 2D Materials Ⅰ		Registration
		Seungki Chae [Invited] Woo Sik Yoo [Invited]	Introduction for ISPB Nagendra Kaushik [Invited] Anke Schmidt [Invited]	Nozomi Takeuchi [Invited] SUKHWAL MA [Oral]	Julian Schulze [Invited] Kosuke Yamamoto [Invited] Ho Jun Kim [Invited]	Ji-Ung Lee [Invited] Gwan-Hyoung Lee [Invited] Jeong Ho Cho [Invited]
10:00-10:20	20'
10:20-10:30	10'
10:40-11:00	20'	Opening Ceremony [Room A, 104~106]
11:00-12:00	60'	[PL 1] Mark J. Kushner [Room A, 104~106] "Controlling Plasma Reactive Fluxes from mTorr to Liquid Densities"
12:00-13:00	60'	Lunch
13:00-13:20	20'	Hojoong Sun [Oral] Jiheon Kim [Oral]
13:20-13:40	20'		ISPB 2018WB2 Plasma Medicine for Skin Applications Ⅱ	WC2 Plasma and Liquid Ⅱ	WD2 Modeling and Simulation of CCP and ICP	WE2 Nano Devices Using 2D Materials Ⅱ
13:40-14:40	60'	WA2 Plasmas for Environmental Technology
			Klaus-Dieter Weltmann [Keynote] Ihn Han [Invited] Thomas von Woedtke [Invited]	Naoki Shirai [Invited] Dingxin Liu [Invited] Jin Yang [Oral]	Yuan-Hong Song [Invited] Hyonu Chang [Oral] Shu-Xia Zhao [Oral] Jung Yeol Lee [Oral]	Chunxiang Zhu [Invited] Myung-Ho Bae [Invited] Hoijoon Kim [Oral] Mun Seok Jeong [Oral]
		Tomohiro Nozaki [Invited] Jun-Hyun Kim [Oral] Hae Sung You [Oral] Asuki Iwasaki [Oral]
14:40-14:50	10'
14:50-15:00	10'
15:00-15:10	10'
15:10-15:30	20'	Coffee Break
15:30-17:00	90'	WA3 Sensors for Wearable Electronics	ISPB 2018WB3 Plasma Medicine for Skin Applications Ⅲ	WC3 Plasma and Liquid Ⅲ	WD3 Atmospheric Pressure Discharges and Thermal Plasmas	WE3 Nano Devices Using 2D Materials Ⅲ
		Hyunhyb Ko [Invited] Sunkook Kim [Invited] Tran Quang Trung [Invited] Hyoun Woo Kim [Oral] Adeela Hanif [Oral]	Ku Youn Baik [Invited] Kai Masur [Invited] Sybille Hasse [Invited] Seung-Ho YI [Oral] Buil Jeon [Oral]	Yan Feng [Invited] Takao Namihira [Invited] Takeshi Hagio [Invited] Yano Masaaki [Oral] Dong-Wook Kim [Oral]	Anbang Sun [Invited] Bernard Parent [Oral] Jiri Jenista [Oral] Yanhui Wang [Oral] Yuantao Zhang [Invited]	Suk-Ho Choi [Invited] Young Jae Song [Invited] Mun Seok Jeong [Invited]
17:00-17:20	20'					WE4 Nano Devices Using 2D Materials Ⅳ
17:20-17:30	10'						Poster Session 1 with Beer Party
17:30-17:40	10'
17:40-18:30	50'					Haeseong Lee [Invited] Ha-Jin Lee [Invited] Soon-Il Yeo [Invited]
18:30-19:00	30'

July 26 (Thu.)
Time/Place		Room A (#104~106)	Room B (#113)	Room C (#114)	Room D (#115)	Room E (#107~108)	Room F (#117~118)	Lobby
09:00-10:00	60'	TA1 Sputtering Technologies	ISPB 2018TB1 Plasma Medicine for Skin Applications Ⅳ	TC1 Plasma and Liquid Ⅳ	TD1 Plasma Sources and Technologies Ⅰ			Registration
		Andreas Pflug [Invited] Seong Bong Kim [Invited] Jun Xu [Invited]	Alexander Fridman [Keynote] Hansup Uhm [Invited] Debarati Shome [Oral]	Nagahiro Saito [Invited] SangYul LEE [Invited]	Uwe Czarnetzki [Keynote] Rod Boswell [Invited] Jaeho Kim [Invited]
10:00-10:30	30'
10:30-10:40	10'
10:40-11:00	20'	Coffee Break
11:00-12:00	60'	[PL 2] Hans-Robert Metelmann [Room A, 104~106] "Plasma Technology and Skin Cancer: Benefit of Survival in Comparison with Standard Chemotherapy"
12:00-13:20	80'	Lunch
13:20-14:50	90'	TA2 Plasma Farming Ⅰ	ISPB 2018TB2 Plasma Medicine for Cancer Applications	TC2 Next Generation Plasma Etching Ⅰ	TD2 Plasma Sources and Technologies Ⅱ	TE1 Plasma for Nanomaterial Processing Ⅰ
		Won Ho Choe [Invited] P. J. Cullen [Invited] Gregory Fridman [Invited] Seungmin Ryu [Oral]	Sun Jung Kim [Invited] Svetlana Ermolaeva [Invited] Manish Adhikari [Invited]	Nam Hun Kim [Invited] Yunchang Jang [Oral] Jason Kenney [Invited]	Fei Gao [Invited] Hyyong Suk [Invited] Yong-Xin Liu [Invited] Yue Hua [Oral]	Tzahi Cohen-Karni [Invited] Hyung-Mo Jeong [Invited] Sojung Kang [Oral] Shinsuke Mori [Oral]
14:50-15:00	10'
15:00-15:10	10'
15:10-15:30	20'	Coffee Break
15:30-16:50	80'	TA3 Plasma Farming Ⅱ	ISPB 2018TB3 Plasma Characterization Ⅰ	TC3 Next Generation Plasma Etching Ⅱ	TD3 Plasma Sources and Technologies Ⅲ	TE2 Plasma for Nanomaterial Processing Ⅱ
		Sanghoo Park [Invited] Masafumi Ito [Invited] Y.S. Mok [Oral] Matej Holc [Oral]	David Graves [Invited] Seiji Kanazawa [Invited] Jun-Seok Oh [Invited]	Thorsten Lill [Invited] Eric A Joseph [Invited] Albert Ellingboe [Invited]	Xian Meng [Invited] Sooseok Choi [Invited] Takafumi Okuma [Invited] Manabu Tanaka [Oral] Hitoshi Tamura [Oral]	Toshiaki Kato [Invited] Seunghun Lee [Oral] Minseok Kim [Oral] Jai Young Chung [Oral] Byeong-Joo Lee [Oral]
16:50-17:00	10'
17:00-17:10	10'
17:10-17:20	10'
17:20-17:30	10'
17:30-17:40	10'						Poster Session 2 with Beer Party
17:40-19:00	80'

July 27 (Fri.)
Time/Place		Room A (#104~106)	Room B (#113)	Room C (#114)	Room D (#115)	Room E (#107~108)	Room F (#117~118)	Lobby
09:00-09:10	10'	FA1 Sputtering / Ion Beam Applications	ISPB 2018FB1 Plasma Characterization Ⅱ		FD1 Fundamental Processes in Plasma Ⅰ	FE1 Energy and Related Devices		Registration
09:10-10:20	70'			FC1 Plasma & Atomic Layer Etching Ⅰ
		Yu Zhang [Oral] Jitendra Pal SINGH [Oral] Junghoon Joo [Oral] Kyungwon Lee [Oral]	Jean-Michel Pouvesle [Keynote] Vittorio Colombo [Invited] Satoshi Hamaguchi [Invited]		Jonathan Tennyson [Invited] Yoshiharu Nakamura [Invited] Heechol Choi [Oral] Yeunsoo Park [Oral]	Kyoungsik Kim [Invited] Taewan Kim [Invited] Qi Shi [Oral] Kumar Mallem [Oral] Heeyeon Park [Oral]
				Kuntack Lee [Keynote] Sumit Agarwal [Oral] Alok Ranjan [Invited]
10:20-10:40	20'
10:40-11:00	20'	Coffee Break
11:00-12:00	60'	[PL3] Jaihyung Won [Room A, 104~106] "Plasma Enhanced Equipment Engineering for Semiconductor Devices"
12:00-13:20	80'	Lunch
13:20-13:40	20'	FA2 Plasma Farming Ⅲ	ISPB 2018FB2 Plasma Biomaterial Ⅰ		FD2 Fundamental Processes in Plasma Ⅱ	FE2 Flexible / Stretchable Display Technology Ⅰ
13:40-14:10	30'			FC2 Plasma & Atomic Layer Etching Ⅱ
		Cheorun Jo [Invited] Douyan Wang [Invited] Hae In Yong [Oral] Sung-Young Yoon [Oral]	Introduction for PBRC & APMC XinPei Lu [Invited] Weontae Lee [Invited] Pankaj Attri [Invited]		Qiu-Yue Nie [Invited] PUNIT Kumar [Oral]	Gerhard Domann [Invited] Byung Hee Hong [Invited] Jong-Hyun Ahn [Invited] Sung-Joo Kwon [Oral]
14:10-14:30	20'			Seiji Samukawa [Invited] Abdulrahman H. Basher [Oral] Fred Roozeboom [Invited]
14:30-15:00	30'				FD3 Plasma Assisted Process Monitoring Technologies
15:00-15:10	10'
15:10-15:30	20'	Coffee Break			ShinJae You [Invited] Jongsik Kim [Oral] Hyun-Joon Roh [Oral] SiJun Kim [Oral] Sang Jeen Hong [Oral] Moojin Kim [Oral] Damdae Park [Oral]	Coffee Break
15:30-17:00	90'	FA3 Plasma Farming Ⅳ	ISPB 2018FB3 Plasma Characterization Ⅲ	FC3 Plasma and Liquid Ⅴ		FE3 Flexible / Stretchable Display Technology Ⅱ
		Dong Kee Jeong [Invited] Gyungsoon Park [Invited] Masaharu Shiratani [Invited]	GeonJoon Lee [Invited] Takayuki Ohta [Invited] Dawei Liu [Invited]	Takahiro Ishizaki [Invited] Bongyoung Yoo [Invited] Tatsuru Shirafuji [Invited] Sungmo Moon [Oral]		Chi Hwan Lee [Invited] Yongjin Kim [Invited] JongHyun Jeong [Oral] MunPyo Hong [Oral]
17:00-17:10	10'
17:10-17:20	10'
17:20-17:30	10'
17:30-19:00	90'						Poster Session 3 with Beer Party

July 28 (Sat.)
Time/Place		Room A (#104~106)	Room B (#113)	Room C (#114)	Room D (#115)	Room E (#107~108)	Room F (#117~118)	Lobby
09:00-10:40	100'		ISPB 2018SB1 Plasma Biomaterial Ⅱ	SC1 Plasma ALD / PECVD Ⅰ	SD1 Plasma Sources and Technologies Ⅳ			Registration
			Masaru Hori [Keynote] Jae-Sung Kwon [Invited] Lenka Zajickova [Invited]	Han-Bo-Ram Lee [Invited] Steven George [Invited] Erwin Kessels [Invited] Sean T. Barry [Invited]	Hai-Xing Wang [Invited] Keisuke Takashima [Invited] Yasunori Tanaka [Oral] Kazuki Karashima [Oral]
10:40-10:50	10'	Coffee Break
10:50-12:30	100'		ISPB 2018SB2 Plasma Applications	SC2 Plasma ALD / PECVD Ⅱ	SD2 Plasma Sources and Technologies Ⅴ
			Jang Sick Park [Invited] Dharmendra Kumar Yadav [Invited] Rizwan Wahab [Oral] Norrawit Tonmitr [Oral]	Gregory Parsons [Invited] Mato Knez [Invited] Hyeongtag Jeon [Invited] Sumit Agarwal [Invited]	Jing-Yu Sun [Oral] Kazuki Onda [Oral] Su-Rong Sun [Oral] Jong Woo Park [Oral]
12:30-12:50	20'	Closing Ceremony [Room D, 115]

Topics
1-1	Plasma Farming
1-2	Plasma Bioscience & Medicine (ISPB 2018)
1-3	Plasma & Liquids
2-1	Plasma ALD / PECVD
2-2	Sputtering / Ion Beam Deposition
2-3	Plasma for Nanomaterial Processing
2-4	Next Generation Plasma Etching, Ashing, and Patterning
2-5	Plasmas for Environmental Technology
3-1	Plasma Assisted Process Monitoring Technologies
3-2	Contamination control in Semiconductor / Display Technologies
3-3	Plasma Sources and Technologies
3-4	Modeling and Simulation Techniques
3-6	Fundamental Processes in Plasma
4-1	Nano Devices Using 2D Materials
4-2	Sensors and Actuators
4-3	Energy Related Devices
4-4	Flexible / Stretchable Display Technology

How to See the Session Codes
Day of Week		Room	Session No.	Presentation No.
Wednesday	W	A	1	1
Thursday	T	B	2	2
Friday	F	C	3	3
Saturday	S	D	4	4
		E		5
		F		...